Measurement of OH Radicals in Aqueous Solution Produced by Atmospheric-pressure LF Plasma Jet
S. Kanazawa, T. Furuki, T. Nakaji, S. Akamine, and R. Ichiki
Department of Electrical and Electronic Engineering, Oita University, Japan
Abstract— The chemical effects of the plasma are largely related to the formation of reactive oxygen species (ROS). OH radical is one of the ROS and has a strong oxidation potential. In this study, low frequency (LF) plasma jet was generated at atmospheric-pressure and irradiated onto the surface of aqueous solution. A portion of the OH radicals dissolved into aqueous solution was measured by chemical dosimetry. In-situ observation of OH radicals in a cuvette was performed and estimated the amount of produced OH radicals as well as the consumption of OH radicals for chemical reactions concerning to the degradation of persistent chemical compound. It is shown that measurement of OH radicals in liquid can be achieved by the terephthalate dosimetry with low cost and simple apparatus by using light emitting diodes (LEDs).
Keywords— LF plasma jet, OH radical, terephthalate dosimetry, LED, fluorescence